Ishizawa Keana Nadeshiko Goodbye Pore Makeup Base

Soft & light makeup base covers the bumpy skin. Just spreads lightly where you are concerned about open & black pores such as cheeks and nose, it will make the skin smooth and poreless. This is a makeup base that is covering the pores with a light application that doesn't need techniques.

Ingredients:

Dimethicone, cyclopentasiloxane, (dimethicone / vinyldimethicone) crosspolymer, acrylates crosspolymer, (vinyldimethicone / methicone silsesquioxane) crosspolymer, trimethylsiloxysilicate, isononyl isononanoate, dimethylsilylated silica, silk, sericin , Hydrolyzed silk, hydrolyzed collagen, water soluble collagen, sodium hyaluronate, water soluble collagen crosspolymer, triethoxy capryllysilane, water, BG, hydrogen dimethicone, methicone, phenoxyethanol, titanium oxide, talc, iron oxide, hydroxide AL